Command Slice to (Cut) menu Object/Path (Object/circuit) is intended for a partition of objects on the parts defined by the form of selected object.
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Nota Bene. Thus it is necessary to consider that the object which is required to be broken, should not enter into group. |
To fulfill a partition of objects on a part according to the form of certain object, last should be placed in the uppermost position, for example, by command Bring to Front (On the foreground) menu Object/Arrange (Object/mounting), and it is selected.
Performance of command Slice to (Cut) breaks underlaying objects according to the form of the selected object and deletes it (fig. 7.58) (if it is necessary for the further operation, it is useful to have its copy). All received fragments become selected and to have an opportunity to address to one of them, it is necessary to click the mouse button out of the selected objects, and then to select interesting object.
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| Rice 7.58. Source objects and result of action of command Slice (фрагметы are for descriptive reasons dissolved) |
To break object it is possible and by means of tool Knife (Knife) (
) which allows to work in an interactive mode ("manually"), using the arbitrary line.
For this purpose it is necessary to include the tool and to stretch over object or group of objects a line of a prospective partition (fig. 7.59).
If the partition as the crow flies it is necessary to retain pushed a key [Alt] is required.
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| Rice 7.59. Tool Knife in a palette of tools and result of its operation |
The composite (difficult) circuit represents the object consisting of several objects superimposing each other, combined in a uniform circuit.
Command Make to (Form) menu Object/Compound Paths (the Composite circuit) allows to create Object / difficult circuits, which in areas of overlapping of source objects receive "holes" (fig. 7.60), in particular, can serve as examples of such circuits some letters — "About" or "In" and many other things contrary to the letters consisting of one circuit, for example, "П" or "Г".
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| Rice 7.60. Source objects and result of action of command Compound Paths/Make |
Difficult circuits in a certain level remind bunched objects, therefore for selection of a simple circuit it is necessary to use tool Direct Selection (the Partial selection) (
).
At the same time, it is necessary to mean that creation of very difficult circuits (with many levels of nesting) can lead to problems at the press. If such situation happened, it is necessary to simplify circuits and to achieve identical result more simple means (that, by the way, frequently more elegantly and more effectively).
At creation of difficult circuits it is necessary to consider also that the difficult circuit accepts parameters of filling of the lowermost circuit in "pile" of objects. After a partition of a difficult circuit on simple initial parameters of filling are not recovered.
The difficult circuit is formed from the several selected objects by means of team Make to (Form) menu Object/Compound Paths (Object / the Composite circuit).
After command performance the difficult circuit consists of the areas filled with color or decorative filling, and areas through which "appear through" underlaying objects.
If at the simple circuit which is a part difficult, to change a direction of a vector (after all any circuit is not that other, as a vector which is characterized, besides length, and a direction) it changes "the contribution" to the image for the opposite.
It is fulfilled as follows. By means of tool Direct Selection (the Partial selection) () the necessary simple circuit as a part of the difficult is selected. Then command Show Attributes (to Show attributes) menu Window (Window) which displays palette Attributes (Attributes) is fulfilled.
In palette Attributes (Attributes) are presented two buttons changing a direction of a vector of a circuit — Reverse Path Direction On (Reverse naprav-lenie a circuit) and Reverse Path Direction Off (the Direct direction of a circuit). With their help it is possible to change a vector direction (fig. 7.61).
To break the selected difficult circuit it is possible to (Cancel) by means of command Release menu Object/Compound Paths (Object / the Composite circuit).
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| Rice 7.61. A composite circuit, buttons of a direction of a circuit in palette Attributes and results of action of buttons |
The masking mechanism — extremely productive method of creation of difficult graphic compositions. Its efficiency consists that it is possible to arrange objects without framing of their (cropping) manually. It is Enough to place of them in masking object of the demanded form — обтравочную a mask (clipping mask), and composable objects will have a scheduled appearance (fig. 7.62). Masked objects can be both simple circuits, and composite (compound paths).
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Nota Bene. By the active operation with masks it is necessary to mean that difficult enough masks can cause problems at printout of documents. The elementary solution of a problem, as well as for difficult (composite) circuits — all-round simplification. |
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| Rice 7.62. Source objects and the received masked object |
To clarify an amount of masks in the document, it is necessary to execute command Document Info (the Information on the document) menu File (File) which displays the dialog box with the same name.
In section Objects (Objects) of a dialog box the information on available objects, including on an amount of masks — a line Clipping Masks (fig. 7.63) is resulted.
To learn, whether is the given object a mask, it is necessary to select and execute it commands Selection Only (Only the selected objects) and Objects (Objects) of the menu of a palette. Besides, for selection of all masks in the document there is special command Masks (Masks) of menu Edit/Select (Editing/allocate).
For mask creation it is necessary to select appropriate objects, and masking object (which form masks all remaining objects) should occupy the uppermost position. In the event that masked objects are allocated on different layers this fact should be meant at switch-off of layers or at relocation of objects for layers. About singularities обтравочных masks by operation with layers look in chapter 10.
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| Rice 7.63. A line Clipping Masks in dialog box Document Info |
Then command Make is fulfilled to (Form) menu Object/Clipping Mask (Object/obtravochnaja the mask) which deletes parameters of a circuit and filling of masking object (it "disappears", fulfilling the mission).
> For "extraction" of objects "from under a mask" it is necessary to select masking object and to execute command Release (to Cancel) menu Object/Clipping Mask (Object/obtravochnaja a mask). Thus it is not necessary to forget that at masking object the circuit which in the absence of parameters continues to remain invisible was saved. For correction of such position it is necessary to select this object and to appropriate to it circuit parameters (or filling) or to delete it.
For masks in the program special commands of fixation Lock are provided to (Fix) and termination of fixation Unlock to (Release), allocated in menu Object/Masks (Objects/masks).
The created mask can be edited at any moment: the exacting artist always finds what to correct.
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To select the objects entering into a mask, it is necessary to use tool Group Selection (Selection in group) ( ), as well as by operation with group. |
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To add in an existing mask new object, it is necessary to allocate new object over a mask in position ought on an intention, to execute command Cut to (Cut) menu Edit (Editing). Then by means of tool Direct Selection (the Partial selection) () to select from the masked objects concerning what it is required to allocate new object, and to fulfill one of commands Paste in Front (to Paste forward) or Paste in Back (to Paste back) menu Edit (Editing) depending on that, before this object or behind it should be allocated the new object. |
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To delete from a mask one of objects, it is necessary to select it by means of tool Direct Selection (the Partial selection) () and to delete, for example, selecting command Cut to (Cut) menu Edit (Editing). |
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To use a circuit of a mask not only for cutting off of unnecessary parts of masked objects, but for the graphic purposes, is admissible to appropriate to masking object parameters of filling and обводки in the normal image (fig. 7.64). Look about it in chapter 8. |
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If converting of a vectorial mask in the point image by means of command Rasterize (Растрировать) menu Object (Object) it is necessary to consider that fact is required that the general size of the received point image will include also invisible parts of masked objects (fig. 7.65). |
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| Rice 7.64. The selected circuit of a mask and result of assignment to it of parameters of filling and обводки |
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| Rice 7.65. A vectorial mask and the point image received from it |
Filter Object Mosaic (Vectorial mosaic) menu Filter/Create (Filter/create) is intended for transformation of the point image into a vectorial mosaic (fig. 7.66) — the given number of the colored rectangles, in the set representing the source image.
The given filter "works" with all types of point images, including with formed by means of team Rasterize (Растрировать).
The dialog box with the same name (fig. 7.67) which is caused by menu command Filter/Create with the same name (Filter/create), allows to define following parameters of the image.
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Group New Size (the New size) is intended for change of dimensionality of the image which reference values are displayed in adjacent group Current Size (the Current size). |
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Group Tile Spacing (the Interval between elements) allows to install distance between mosaic elements. The interval forms at the expense of reduction of an element of a mosaic, therefore the range of its values is restricted. |
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Group Number of Tiles (the Amount of elements) serves for setting of an amount of elements across and verticals. |
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To fulfill proportional changes concerning width or height, it is necessary to install switch Constrain Ratio (to Save proportions rather) in appropriate position. Click on button Use Ratio (to Provide proportions) carries out recalculation of values. |
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Switch Result (Result) allows to define type of a received mosaic: switch setting in position Color (Color) defines a color mosaic, and in position Gray (Grey) — a mosaic in gradation gray. |
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Flag Resize using Percentages (to Change the size in percentage) allows to set dimensionality in the relative units. |
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Flag Delete Raster (to Delete the point image) provides removal of the initial point image after its converting in a vectorial mosaic. |
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| Rice 7.66. The initial point image and result of operation of filter Object Mosaic |
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| Rice 7.67. Dialog box Object Mosaic |
Filter Photo Crosshatch (Vectorial photoengraving) menu Filter/Pen and Ink (Filter/hatching) is intended for transformation of the point image into the vectorial object imitating an engraving (the nearest analog — an engraving on metal).
As a result of filter operation there are some layers of hatching, each of which represents a certain range of brightness of the initial point image (fig. 7.68).
In dialog box Photo Crosshatch (the Vectorial photoengraving) (fig. 7.69), which is caused by menu command Filter/Pen with the same name and Ink (the Filter / Hatching), it is possible to define following parameters.
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| Rice 7.68. The initial point image and result of operation of filter Photo Crosshatch |
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| Rice 7.69. Dialog box Photo Crosshatch |
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It is possible to select value from list Hatch Layers (the Amount of layers of hatching) from 1 to 8. To each layer the certain pitch range to what dashes under the histogram testify is put in correspondence. |
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By means of three triangular engines it is possible to change threshold values of black and white colors. The average engine serves for change of threshold value for each range towards white (relocation to the right) or towards black (relocation to the left). Extreme engines define a maximum level light (the right engine) or dark (the left engine). |
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Field Density (Density) defines saturation by hatching elements. |
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Field Dispersion Noise (Random distribution) defines a range of intervals between hatching elements (in a range from 0 to 300 %). |
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Field Thickness (Thickness) defines a thickness of elements of hatching (in a range from 0,1 to 10 points). |
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Field Max. Line Length (the Maximum length of a line) serves for setting of length of a line in a range from 5 to 999 points. |
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Field Rotation Noise (Casual rotation) defines deflection amount at rotation of elements of hatching in a range from—360 to 360 degrees. |
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Field Rotation Variance (rotation Variation) defines value on which the angle of rotation of each layer, in a range from 0 to 100 % differs. |
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In the field Top Angle (the high layer Angle of rotation) is installed an initial angle of rotation for the uppermost layer of hatching in a range from—360 to 360 degrees. |